MoWSeS (317451)

  https://cordis.europa.eu/project/id/317451

  FP7 (2007-2013)

  Nanoelectronics based on two-dimensional dichalcogenides

  Marie-Curie Action: "Initial Training Networks" (FP7-PEOPLE-2012-ITN)

  graphene  ·  coating and films  ·  semiconductivity  ·  metalloids  ·  nanoelectronics

  2013-03-01 Start Date (YY-MM-DD)

  2017-02-28 End Date (YY-MM-DD)

  € 3,703,140 Total Cost


  Description

Semiconductor industry rapidly approaches the performance limits of silicon-based CMOS technology. This proposal aims to pave the way to electronic circuits based on two-dimensional transition metal dichalcogenides (TMDs), newly emerging semiconducting analogues of graphene. TMDs can be rapidly exfoliated in the liquid phase into single layers starting from powders and provide solutions of 2D materials that can be coated over large areas. The recently achieved transistors based on single-layer MoS2 indicate a mobility comparable or even higher than silicon thin films or graphene nanoribbons, but with much lower leakage currents. In a joint effort of wet and gas phase chemistry and deposition techniques, nanoanalytics, electronic and optical spectroscopy, electronic device fabrication and characterisation, and theoretical modeling we aim to control the production and deposition of TMD nanolayers and nanoribbons, understand and control the interplay between morphology, defects and electrical properties, understand electrical transport through semiconducting nanolayers, and fabricate nanodevices. By combining the ease of processing commonly associated with organic electronics with superior electrical properties, we will demonstrate a new type of low-power, low-cost field effect transistor based on a single TMD layer and/or nanoribbon. The proposed outcomes of immediate interest for the three full partners from industry are (i) process flows and practices that enable fabrication of nanoscale transistor arrays for application in flexible electronics via spraying and/or ink-jet printing, (ii) software packages for modeling the electronic behavior of TMD nanolayers, and (iii) a prototype reactor for their large-scale growth and deposition. The training and dissemination activities will be complemented by an associated partner who will produce educational videos together with the young researchers of the consortium.


  Complicit Organisations

1 Israeli organisation participates in MoWSeS.

Country Organisation (ID) VAT Number Role Activity Type Total Cost EC Contribution Net EC Contribution
Ireland THE PROVOST, FELLOWS, FOUNDATION SCHOLARS & THE OTHER MEMBERS OF BOARD, OF THE COLLEGE OF THE HOLY & UNDIVIDED TRINITY OF QUEEN ELIZABETH NEAR DUBLIN (999845446) IE2200007U participant HES € 0 € 550,098 € 0
Slovenia INSTITUT JOZEF STEFAN (999971837) SI55560822 participant REC € 0 € 480,403 € 0
Israel WEIZMANN INSTITUTE OF SCIENCE (999979306) IL520016858 participant HES € 0 € 469,435 € 0
Germany CONSTRUCTOR UNIVERSITY BREMEN GGMBH (999897147) DE199098639 participant HES € 0 € 748,483 € 0
Switzerland ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (999973971) CHE116075613TVA coordinator HES € 0 € 552,957 € 0
Germany EVONIK INDUSTRIES AG (962748475) DE811160003 participant PRC € 0 € 249,494 € 0
Netherlands SOFTWARE FOR CHEMISTRY & MATERIALS BV (998282485) NL807270143B01 participant PRC € 0 € 402,773 € 0
Germany AIXTRON SE (966782414) DE123597183 participant PRC € 0 € 249,494 € 0