OPTIMAL (101057029)

  https://cordis.europa.eu/project/id/101057029

  Horizon Europe (2021-2027)

  Automated Maskless Laser Lithography Platform for First Time Right Mixed Scale Patterning

  Laser-based technologies for green manufacturing (Photonics - Made in Europe Partnerships) (RIA) (HORIZON-CL4-2021-TWIN-TRANSITION-01-03)

  manufacturing engineering  ·  lab on a chip  ·  virtual reality  ·  laser physics

  2022-10-01 Start Date (YY-MM-DD)

  2026-09-30 End Date (YY-MM-DD)

  € 5,616,876


  Description

Laser-based technologies for creating structures in the range from nanometer up to millimeter size find many applications such as free form optics, photonics, multifunctional surfaces, lab-on-chip, etc. with a global market volume of > 200 billion euros. The original structures know as masters are the first step in the making of tools for key-enabling technologies like injection molding or nanoimprinting. Some of the current limitations in the laser lithography processes are the limited depth of the structures, small area and low speed at process level, high-power consumption in the laser interference lithography, and multiple and expensive processes required for the development of hierarchical multifunctional structures at industrial level. The OPTIMAL project will integrate for the first-time different laser lithography technologies, quality monitoring systems and processes in one platform for the development of structures with (i) high depth (150 micrometer), ii) dimensions in the range from 100 nm to sub-mm in XYZ, iii) 2D&3D shape on flat surface, (iv) combining parallel & serial patterning, (v) no need for external treatments on samples; vi) increased speed (1 cm2/min) and large area (up to 2000 cm2), vii) > 40% of reduction in the consumption of resources for the whole manufacturing process. The OPTIMAL project uses self-learning algorithms to optimize the virtual photomask as well as integrates methods for an inline control of the laser patterning. By accelerating and upscaling the structuring process, the OPTIMAL project will increase the process efficiency and yield, which will reduce the energy consumption, avoid material waste, decrease costs, and lead time in many applications. The platform will potentiate the possibilities in the sustainable making of high quality, versatile, less costly masters for industrial manufacturing, as demonstrated in 4 use cases (optical lenses, multifunctional riblet structures, virtual reality lens, microfluidic chips).


  Complicit Organisations

1 Israeli organisation participates in OPTIMAL.

Country Organisation (ID) VAT Number Role Activity Type Total Cost EC Contribution Net EC Contribution
Austria JOANNEUM RESEARCH FORSCHUNGSGESELLSCHAFT MBH (999981537) ATU28781306 coordinator REC € 1,652,264 € 1,652,264 € 1,652,264
Italy UNIVERSITA DEGLI STUDI DI PARMA (999846028) IT00308780345 participant HES € 538,125 € 538,124 € 538,124
Denmark DELTAPIX APS (957262446) DK26145260 participant PRC € 606,842 € 606,842 € 606,842
Austria SONY DADC EUROPE GMBH (889808258) ATU76064134 participant PRC € 586,786 € 586,786 € 586,786
Germany FRAUNHOFER GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG EV (999984059) DE129515865 participant REC € 53,232 € 53,232 € 53,232
Germany BASF COATINGS GMBH (942438615) DE811122710 participant PRC € 425,500 € 425,500 € 425,500
Slovakia CENTRUM VEDECKO TECHNICKYCH INFORMACII SLOVENSKEJ REPUBLIKY (951533044) SK2020798395 participant PUB € 470,500 € 470,500 € 470,500
Israel HYPERVISION LTD (884802088) IL516092962 participant PRC € 277,250 € 277,250 € 277,250
Slovakia ZILINSKA UNIVERZITA V ZILINE (999969606) SK2020677824 participant HES € 426,125 € 426,125 € 426,125
Germany MICRO RESIST TECHNOLOGY GESELLSCHAFT FUER CHEMISCHE MATERIALIEN SPEZIELLER PHOTORESISTSYSTEME MBH (999604207) DE157534120 participant PRC € 580,250 € 580,250 € 580,250